Title:
FLOW RATIO CONTROL DEVICE, PROGRAM FOR FLOW RATIO CONTROL DEVICE, AND FLOW RATIO CONTROL METHOD
Document Type and Number:
WIPO Patent Application WO/2018/047644
Kind Code:
A1
Abstract:
To provide a flow ratio control device with which it is possible, not only to achieve a target flow ratio, but also to control the time required to achieve the target flow ratio, provided is a flow ratio control device, comprising: a main flow path; a plurality of branch flow paths which branch from a terminal end of the main flow path; a plurality of fluid control devices which are disposed upon each of the branch flow paths, and each of which comprises a valve and a pressure-type flow sensor which is positioned to the downstream side of the valve; and an operation setting unit which, on the basis of a target flow ratio, sets one of the fluid control devices from among the plurality of fluid control devices to operate in a flow speed control mode for controlling a flow speed of a fluid to the upstream side of each of the valves, and sets the other fluid control devices to operate in a flow rate control mode for controlling the flow rate on the basis of a target flow rate.
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Inventors:
YASUDA TADAHIRO (US)
LOWERY PATRICK ALLEN (US)
WHITE WILLIAM WYLIE (US)
EBERT BRIAN JAMES (US)
GUNDLACH MAXIMILIAN MARTIN (US)
DICK JOHN THOMAS (US)
LOWERY PATRICK ALLEN (US)
WHITE WILLIAM WYLIE (US)
EBERT BRIAN JAMES (US)
GUNDLACH MAXIMILIAN MARTIN (US)
DICK JOHN THOMAS (US)
Application Number:
PCT/JP2017/030637
Publication Date:
March 15, 2018
Filing Date:
August 25, 2017
Export Citation:
Assignee:
HORIBA STEC CO LTD (JP)
International Classes:
G05D7/06; G01F1/00; G01F1/48; G05D11/13
Domestic Patent References:
WO2009084422A1 | 2009-07-09 | |||
WO2008072614A1 | 2008-06-19 |
Foreign References:
JP2004280788A | 2004-10-07 | |||
JP2014059609A | 2014-04-03 | |||
JP2009508066A | 2009-02-26 | |||
JP2015049569A | 2015-03-16 |
Attorney, Agent or Firm:
NISHIMURA, Ryuhei (JP)
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