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Patent Searching and Data


Title:
FLOW RATIO CONTROL DEVICE, PROGRAM FOR FLOW RATIO CONTROL DEVICE, AND FLOW RATIO CONTROL METHOD
Document Type and Number:
WIPO Patent Application WO/2018/047644
Kind Code:
A1
Abstract:
To provide a flow ratio control device with which it is possible, not only to achieve a target flow ratio, but also to control the time required to achieve the target flow ratio, provided is a flow ratio control device, comprising: a main flow path; a plurality of branch flow paths which branch from a terminal end of the main flow path; a plurality of fluid control devices which are disposed upon each of the branch flow paths, and each of which comprises a valve and a pressure-type flow sensor which is positioned to the downstream side of the valve; and an operation setting unit which, on the basis of a target flow ratio, sets one of the fluid control devices from among the plurality of fluid control devices to operate in a flow speed control mode for controlling a flow speed of a fluid to the upstream side of each of the valves, and sets the other fluid control devices to operate in a flow rate control mode for controlling the flow rate on the basis of a target flow rate.

Inventors:
YASUDA TADAHIRO (US)
LOWERY PATRICK ALLEN (US)
WHITE WILLIAM WYLIE (US)
EBERT BRIAN JAMES (US)
GUNDLACH MAXIMILIAN MARTIN (US)
DICK JOHN THOMAS (US)
Application Number:
PCT/JP2017/030637
Publication Date:
March 15, 2018
Filing Date:
August 25, 2017
Export Citation:
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Assignee:
HORIBA STEC CO LTD (JP)
International Classes:
G05D7/06; G01F1/00; G01F1/48; G05D11/13
Domestic Patent References:
WO2009084422A12009-07-09
WO2008072614A12008-06-19
Foreign References:
JP2004280788A2004-10-07
JP2014059609A2014-04-03
JP2009508066A2009-02-26
JP2015049569A2015-03-16
Attorney, Agent or Firm:
NISHIMURA, Ryuhei (JP)
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