Title:
FLUID CONTROL DEVICE AND GAS SUPPLY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/047870
Kind Code:
A1
Abstract:
In order to make it possible to keep a device compact even when a plurality of fluid control valves are used to control a fluid having a high flow rate, the present invention is provided with: a block 10 in which an internal flow path L is formed; fluid control valves 20 which are provided on an apparatus placement surface 12 of the block 10; and a pressure sensor 31 which detects the pressure of a fluid flowing in the internal flow path L, wherein a recess 14 is formed in a side surface 13 of the block 10, and the pressure sensor 31 is accommodated in the recess 14.
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Inventors:
SHAKUDO KAZUYA (JP)
Application Number:
PCT/JP2022/031745
Publication Date:
March 30, 2023
Filing Date:
August 23, 2022
Export Citation:
Assignee:
HORIBA STEC CO LTD (JP)
International Classes:
F16K27/00; G05D7/06
Foreign References:
| JP2001242940A | 2001-09-07 | |||
| JP2020107110A | 2020-07-09 | |||
| US20200124196A1 | 2020-04-23 | |||
| JP2005149075A | 2005-06-09 |
Attorney, Agent or Firm:
NISHIMURA, Ryuhei et al. (JP)
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