Title:
FLUORINE-CONTAINING ETHER COMPOUND, COMPOSITION CONTAINING SAME, COATING SOLUTION, AND PRODUCT
Document Type and Number:
WIPO Patent Application WO/2019/208503
Kind Code:
A1
Abstract:
Provided is a fluorine-containing ether compound, with which it is possible to form a surface layer having excellent abrasion resistance and fingerprint dirt removal characteristics comparable to the prior art, and further having excellent light resistance in comparison with the prior art. This fluorine-containing ether compound comprises a polyfluoropolyether chain and a group represented by X, said compound preferably being represented by (G1-)tQ1(-X)s or (X-)sQ2-G2-Q2(-X)s [where G1 is a monovalent polyfluoropolyether chain, G2 is a divalent polyfluoropolyether chain, Q1 is an organic group having a valence of s+t, Q2 is an organic group having a valence of s+1, s is an integer greater than or equal to 1, t is an integer greater than or equal to 1, X is -Si(R1)3-a[-(OSi(R2)2)b-O-Si(R3)3-c(L)c]a, R1 is an alkyl group, R2 is an alkyl group or the like, R3 is an alkyl group, L is a hydrolysable group or a hydroxyl group, a is 2 or 3, b is an integer from 0 to 5, and c is 2 or 3].
Inventors:
MATSUURA KEIGO (JP)
MURATA KOICHI (JP)
FURUKAWA YUTAKA (JP)
HOSHINO TAIKI (JP)
UNO MAKOTO (JP)
ANRAKU EIICHIRO (JP)
MURATA KOICHI (JP)
FURUKAWA YUTAKA (JP)
HOSHINO TAIKI (JP)
UNO MAKOTO (JP)
ANRAKU EIICHIRO (JP)
Application Number:
PCT/JP2019/017038
Publication Date:
October 31, 2019
Filing Date:
April 22, 2019
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
C08G65/336; C07F7/18; C09D171/00; C09K3/18
Foreign References:
| JPS5239632A | 1977-03-28 | |||
| JPS57145147A | 1982-09-08 | |||
| JPS57126823A | 1982-08-06 |
Other References:
SCOTT, ROBERT N. ET AL.: "Silicate Cluster Fluids", IND. ENG. CHEM. PROD. RES. DEV., vol. 19, no. 1, 1 March 1980 (1980-03-01), pages 6 - 11, XP055646044
CASANOVAS, JORDI ET AL.: "Ab initio calculations of 29Si solid state NMR chemical shifts of silane and silanol groups in silica", CHEMICAL PHYSICS LETTERS, vol. 326, no. 5-6, 25 August 2000 (2000-08-25), pages 523 - 529, XP055646050
CASANOVAS, JORDI ET AL.: "Ab initio calculations of 29Si solid state NMR chemical shifts of silane and silanol groups in silica", CHEMICAL PHYSICS LETTERS, vol. 326, no. 5-6, 25 August 2000 (2000-08-25), pages 523 - 529, XP055646050
Attorney, Agent or Firm:
T.S. PARTNERS et al. (JP)
Download PDF: