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Patent Searching and Data


Title:
FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME
Document Type and Number:
WIPO Patent Application WO/2005/019284
Kind Code:
A1
Abstract:
A fluoropolymer which has functional groups and is highly transparent in a wide wavelength region; and a resist composition containing the fluoropolymer. The fluorocopolymer comprises: units derived from a fluorinated diene represented by the following formula (1) and formed by the cyclopolymerization of the monomer; and units derived from other monomer(s) and formed by the cyclopolymerization thereof or units derived from an acrylic monomer and formed by the polymerization thereof. The resist composition contains the fluorocopolymer as a base polymer. CF2=CFCH2CH(CH2C(CF3)2(OR1))CH2CH=CH2 (1) In the formula, R1 is hydrogen, C20 or lower alkyl optionally having etheric oxygen, C6 or lower alkoxycarbonyl, or CH2R2 (wherein R2 is C6 or lower alkoxycarbonyl).

Inventors:
TAKEBE YOKO (JP)
EDA MASATAKA (JP)
YOKOKOJI OSAMU (JP)
Application Number:
PCT/JP2004/011937
Publication Date:
March 03, 2005
Filing Date:
August 19, 2004
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
TAKEBE YOKO (JP)
EDA MASATAKA (JP)
YOKOKOJI OSAMU (JP)
International Classes:
G03F7/039; C08F220/10; C08F236/20; G03F7/004; H01L21/027; (IPC1-7): C08F236/20; C08L47/00; G03F7/033; G03F7/039
Domestic Patent References:
WO2002064648A12002-08-22
WO2002065212A12002-08-22
Attorney, Agent or Firm:
Senmyo, Kenji (Kanda-Higashimatsushitacho Chiyoda-k, Tokyo 42, JP)
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