FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME

WIPO Patent Application WO/2005/019284

A1

A fluoropolymer which has functional groups and is highly transparent in a wide wavelength region; and a resist composition containing the fluoropolymer. The fluorocopolymer comprises: units derived from a fluorinated diene represented by the following formula (1) and formed by the cyclopolymerization of the monomer; and units derived from other monomer(s) and formed by the cyclopolymerization thereof or units derived from an acrylic monomer and formed by the polymerization thereof. The resist composition contains the fluorocopolymer as a base polymer. CF₂=CFCH₂CH(CH₂C(CF₃)₂(OR¹))CH₂CH=CH₂ (1) In the formula, R¹ is hydrogen, C₂₀ or lower alkyl optionally having etheric oxygen, C₆ or lower alkoxycarbonyl, or CH₂R² (wherein R² is C₆ or lower alkoxycarbonyl).

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TAKEBE YOKO (JP)
EDA MASATAKA (JP)
YOKOKOJI OSAMU (JP)

PCT/JP2004/011937

March 03, 2005

August 19, 2004

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ASAHI GLASS CO LTD (JP)
TAKEBE YOKO (JP)
EDA MASATAKA (JP)
YOKOKOJI OSAMU (JP)

G03F7/039; C08F220/10; C08F236/20; G03F7/004; H01L21/027; (IPC1-7): C08F236/20; C08L47/00; G03F7/033; G03F7/039

WO2002064648A1	2002-08-22
WO2002065212A1	2002-08-22

Senmyo, Kenji (Kanda-Higashimatsushitacho Chiyoda-k, Tokyo 42, JP)

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