FOCUSED ENERGY BEAM DEVICE

WIPO Patent Application WO/2022/054431

A1

A focused energy beam device equipped with a support part for supporting a substrate to be processed and a focused energy beam column which is provided with a differential pump and is capable of relative movement so as to correspond to a desired region of a surface to be processed of the substrate to be processed, wherein: said support part supports only the edge of the substrate to be processed, which is positioned horizontally; a positive pressure chamber for preventing flexure caused by the weight of the substrate to be processed itself by providing positive pressure across the entire region to be processed of the substrate to be processed is positioned below the substrate to be processed, which is supported by the support part; and a local negative pressure mechanism is provided inside said positive pressure chamber so as to offset the suction force of the differential pump by providing negative pressure while not contacting the undersurface of the substrate to be processed and so as to be capable of moving relative to the substrate to be processed so as to follow the differential pump while maintaining the state of opposing said differential pump with the substrate to be processed interposed therebetween.

MIZUMURA MICHINOBU (JP)
ARAI TOSHINARI (JP)
MATSUMOTO TAKANORI (JP)
TAKESHITA TAKURO (JP)

PCT/JP2021/027703

March 17, 2022

July 27, 2021

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V TECH CO LTD (JP)

H01J37/18; G03F1/74; G03F7/20; H01J37/20; H01J37/317; H01L21/027

JP2010040990A	2010-02-18
JPS6071038A	1985-04-22
JPH01128525A	1989-05-22
JPH0922110A	1997-01-21

NISSAY INTERNATIONAL PATENT OFFICE (JP)

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