Title:
FOCUSED ION BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/038904
Kind Code:
A1
Abstract:
[Solution] Provided is a focused ion beam device comprising: a differential exhaust device and a focused ion beam column, and further comprising a vacuum pad made of a porous material that exposes a suction surface so as to surround the planar-direction outer side of a substrate to be processed, a substrate support on which the substrate to be processed and the vacuum pad are placed, and a vacuum pump for vacuum-suctioning the vacuum pad. When the head unit of the differential exhaust device moves to the planar-direction outer side of the substrate to be processed, the suction surface suctions air in the space between the suction surface and the head unit. The focused ion beam device does not require a large vacuum chamber, enables processing in the vicinity of the edge of the substrate to be processed, and makes it possible to increase the size of the processing region on the substrate to be processed.
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Inventors:
MIZUMURA MICHINOBU (JP)
Application Number:
PCT/JP2021/024560
Publication Date:
February 24, 2022
Filing Date:
June 29, 2021
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
H01J37/18; H01J37/20; H01J37/28; H01J37/317
Foreign References:
| JP2001343021A | 2001-12-14 | |||
| JP2000006072A | 2000-01-11 |
Attorney, Agent or Firm:
NISSAY INTERNATIONAL PATENT OFFICE (JP)
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