Title:
GALLIUM INDIUM NITRIDE ARSENIDE HETERO-FIELD-EFFECT TRANSISTOR, ITS MANUFACTURING METHOD, AND TRANSMITTER/RECEIVER USING SAME
Document Type and Number:
WIPO Patent Application WO/2004/040638
Kind Code:
A1
Abstract:
A hetero-field-effect transistor comprises an InP substrate (21), a channel layer (23) formed on a buffer layer (22) on the InP substrate, a spacer layer (25a) made of a semiconductor having a bandgap larger than that of the channel layer and having a heterojunction with the channel layer, and a carrier supply layer (26) adjacent to the spacer layer. The channel layer includes a predetermined semiconductor layer made of a compound semiconductor the composition of which is expressed by chemical formula GaxIn1-xNyA1-y, where A is As or Sb, the number x is 0≤x≤0.2, the number y is 0.03≤y≤0.10.
Inventors:
OTSUKA NOBUYUKI (JP)
MIZUNO KOICHI (JP)
YOSHII SHIGEO (JP)
SUZUKI ASAMIRA (JP)
MIZUNO KOICHI (JP)
YOSHII SHIGEO (JP)
SUZUKI ASAMIRA (JP)
Application Number:
PCT/JP2003/013747
Publication Date:
May 13, 2004
Filing Date:
October 28, 2003
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD (JP)
OTSUKA NOBUYUKI (JP)
MIZUNO KOICHI (JP)
YOSHII SHIGEO (JP)
SUZUKI ASAMIRA (JP)
OTSUKA NOBUYUKI (JP)
MIZUNO KOICHI (JP)
YOSHII SHIGEO (JP)
SUZUKI ASAMIRA (JP)
International Classes:
H01L21/335; H01L21/338; H01L29/778; H01L29/812; H01L29/20; (IPC1-7): H01L21/338; H01L29/778; H01L29/812; H01L21/203; H01L21/205
Foreign References:
JP2003289082A | 2003-10-10 | |||
JP2000091559A | 2000-03-31 | |||
JP2000164852A | 2000-06-16 | |||
JP2002094187A | 2002-03-29 | |||
JP2000216101A | 2000-08-04 | |||
JP2003197644A | 2003-07-11 |
Other References:
HANG, D.R. ET AL: "Shubnikov-de Haas oscillations of two-dimensional electron gas in an InAsN/InGaAs single quantum well.", SEMICONDUCTOR SCIENCE AND TECHNOLOGY, vol. 17, no. 9, September 2002 (2002-09-01), pages 999 - 1003, XP002974974
WANG, JYH-SHYANG ET AL: "Growth of InAsN/InGaAs(P) quantum wells on inP by gas source molecular beam epitaxy.", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B, vol. 19, no. 1, 2001, pages 202 - 206, XP002974975
WANG, JYH-SHYANG ET AL: "Growth of InAsN/InGaAs(P) quantum wells on inP by gas source molecular beam epitaxy.", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B, vol. 19, no. 1, 2001, pages 202 - 206, XP002974975
Attorney, Agent or Firm:
Sumida, Yoshihiro (3rd Fl. Bo-eki Bldg., 123-1, Higashi-machi, Chuo-k, Kobe-shi Hyogo, JP)
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