Title:
GAS BARRIER FILM AND METHOD FOR MANUFACTURING GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2021/024873
Kind Code:
A1
Abstract:
A gas barrier film according to the present invention comprises: a substrate primarily composed of polyethylene or polypropylene; a gas barrier layer formed on the substrate; and a coating layer formed on the gas barrier layer. The elemental ratio O/C of oxygen and carbon in the substrate surface on which the gas barrier layer is formed is 0.03 or higher.
Inventors:
OSAWA KENTA (JP)
Application Number:
PCT/JP2020/029013
Publication Date:
February 11, 2021
Filing Date:
July 29, 2020
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
B32B27/32
Domestic Patent References:
| WO2011108609A1 | 2011-09-09 |
Foreign References:
| JPH10323938A | 1998-12-08 | |||
| JP2014114493A | 2014-06-26 | |||
| JPH07330922A | 1995-12-19 | |||
| JP2004314562A | 2004-11-11 | |||
| JP2010189474A | 2010-09-02 | |||
| JP2019177497A | 2019-10-17 | |||
| JP2020070429A | 2020-05-07 | |||
| JP2019143284A | 2019-08-29 |
Other References:
See also references of EP 4008552A4
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
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