Title:
GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2014/203892
Kind Code:
A1
Abstract:
[Problem] To provide a gas barrier film which exhibits sufficient gas barrier performance even under high temperature high humidity conditions.
[Solution] A gas barrier film which comprises, in the following order, a base, a first layer that has barrier properties and a second layer that is formed by an atomic layer deposition method, and which is characterized in that: the second layer contains a region, in which the carbon concentration is from 0.3 at% to 3.0 at% (inclusive) relative to the total amount of aluminum, titanium, silicon, zirconium, oxygen and carbon, so that the region makes up 30% or more of the thickness of the second layer; and the carbon concentration relative to the total amount of aluminum, titanium, silicon, zirconium, oxygen and carbon in the second layer is 3.0 at% or less.
Inventors:
HIROSE TATSUYA (JP)
KAWAMURA TOMONORI (JP)
KAWAMURA TOMONORI (JP)
Application Number:
PCT/JP2014/066030
Publication Date:
December 24, 2014
Filing Date:
June 17, 2014
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; B32B27/00; C23C16/455
Domestic Patent References:
| WO2012081555A1 | 2012-06-21 | |||
| WO2012077553A1 | 2012-06-14 | |||
| WO2014092085A1 | 2014-06-19 |
Foreign References:
| JP2011241421A | 2011-12-01 | |||
| JP2006068992A | 2006-03-16 | |||
| JP2012081632A | 2012-04-26 | |||
| JP2011073430A | 2011-04-14 | |||
| JP5565537B1 | 2014-08-06 |
Attorney, Agent or Firm:
HATTA & ASSOCIATES (JP)
Hatta international patent business corporation (JP)
Hatta international patent business corporation (JP)
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