Title:
GAS BARRIER FILM, OPTICAL ELEMENT, AND METHOD FOR PRODUCING GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2019/171826
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a transfer-type gas barrier film having high gas barrier property, an optical element using the gas barrier film, and a method for producing the gas barrier film. The gas barrier film comprises a substrate; a peel resin layer from which the substrate can be peeled; at least one inorganic layer, and an adhesive layer disposed on an inorganic layer that is farthest from the substrate, wherein the inorganic layer is disposed on the surface of the peel resin layer, and the peel resin layer is a layer of a resin containing a phenyl group; and the adhesive layer is in solid form at an ordinary temperature and flows by heating to exhibit adhesive property.
Inventors:
IWASE EIJIRO (JP)
Application Number:
PCT/JP2019/002831
Publication Date:
September 12, 2019
Filing Date:
January 29, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
B32B7/06; B32B9/00; B32B27/36; H01L51/50; H05B33/04
Domestic Patent References:
| WO2013065812A1 | 2013-05-10 | |||
| WO2014163189A1 | 2014-10-09 | |||
| WO2015159887A1 | 2015-10-22 |
Foreign References:
| JP2001205768A | 2001-07-31 | |||
| JP2007118564A | 2007-05-17 | |||
| JPH08234181A | 1996-09-13 |
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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