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Title:
GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2015/115314
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a gas barrier film which exhibits high gas barrier performance, while having excellent bending resistance. A gas barrier film according to the present invention sequentially comprises, on at least one surface of a polymer base, an inorganic layer (A) and a silicon compound layer (B) in this order from the polymer base side. The silicon compound layer (B) contains at least silicon compounds having structures represented by SiNxHy, SiOpNq and SiOa(OH)4-2a (wherein x + y = 4, p + q =4, a < 2 and x, y, p, q > 0); and the inorganic layer (A) and the silicon compound layer (B) are in contact with each other.

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Inventors:
MORI KENTARO (JP)
Application Number:
PCT/JP2015/051772
Publication Date:
August 06, 2015
Filing Date:
January 23, 2015
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
International Classes:
H01L51/50; B32B9/00; H05B33/02; H05B33/04
Foreign References:
JP2013226757A2013-11-07
JP2013198983A2013-10-03
JP2013188871A2013-09-26
JP2012240222A2012-12-10
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