Title:
GAS DISTRIBUTOR, GAS DELIVERY APPARATUS, AND FILM PROCESSING APPARATUS THEREOF
Document Type and Number:
WIPO Patent Application WO/2024/078175
Kind Code:
A1
Abstract:
Disclosed are a gas distributor, a gas delivery apparatus, and a film processing apparatus thereof. The gas distributor comprises a first surface and a second surface, which are oppositely disposed; a gas diffusion channel is provided in the gas distributor, and comprises a concave part having bottom surface protruding out of the second surface, the concave part dividing the area below the second surface into an inner area and a surrounding outer area, and the concave part comprising a first side wall surrounding the inner area and a second sidewall surrounding the first side wall; the first side wall comprises a first gas channel, and the second side wall comprises a second gas channel, gas within the gas diffusion channel entering the inner area and the outer area through the first gas channel and the second gas channel, respectively. The advantages of the present invention are: the gas distributor outputs process gas to different areas by means of the first gas channel and the second gas channel, and on the basis of the flowing convection and diffusion principles, it is possible for process gas to maintain high flow speed while achieving uniform distribution of the process gas, improving the yield and production rate of wafer film deposition.
Inventors:
LI XUEZI (CN)
ZHOU NING (CN)
GONG YUEJUN (CN)
XU CAN (CN)
ZHOU NING (CN)
GONG YUEJUN (CN)
XU CAN (CN)
Application Number:
PCT/CN2023/115815
Publication Date:
April 18, 2024
Filing Date:
August 30, 2023
Export Citation:
Assignee:
ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA (CN)
International Classes:
C23C16/455; B05B1/00; B05B1/14; B05B1/30; C23C16/458; H01L21/67
Attorney, Agent or Firm:
SUNSHINEIP INTELLECTUAL PROPERTY LAW FIRM (CN)
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