Title:
GAS INJECTION UNIT AND A THIN-FILM VAPOUR-DEPOSITION DEVICE AND METHOD USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2011/129492
Kind Code:
A1
Abstract:
Disclosed are a gas injection unit and a thin-film vapour-deposition device and method using the same. The gas injection unit comprises: an inner tube for the inflow of a reaction gas; an outer tube which covers the inner tube and through which flows a cooling fluid for cooling the reaction gas in the inner tube; and an injection tube for injecting the reaction gas inside the inner tube to the outside of the outer tube.
Inventors:
PARK HYEONG SOO (KR)
Application Number:
PCT/KR2010/006021
Publication Date:
October 20, 2011
Filing Date:
September 06, 2010
Export Citation:
Assignee:
SEMES CO LTD (KR)
PARK HYEONG SOO (KR)
PARK HYEONG SOO (KR)
International Classes:
H01L21/205
Foreign References:
| KR20090086374A | 2009-08-12 | |||
| KR20070109384A | 2007-11-15 | |||
| US20080099147A1 | 2008-05-01 | |||
| US20060177579A1 | 2006-08-10 |
Other References:
See also references of EP 2560193A4
None
None
Attorney, Agent or Firm:
KWON, Hyuk-Soo et al. (KR)
κΆνμ (KR)
κΆνμ (KR)
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Claims:
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