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Patent Searching and Data


Title:
GAS-LIQUID CONTACT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/207671
Kind Code:
A1
Abstract:
This gas-liquid contact device comprises a gas-liquid contact unit, a liquid supply system, and a gas supply system. The gas-liquid contact unit includes a plurality of stages which are allocated so as to be arrayed in the lateral direction. Each of the plurality of stages includes a plurality of vertical flat plates arranged parallel to each other at intervals. The liquid supply system supplies a liquid to the gas-liquid contact unit, and causes the liquid to be circulated along the array of the plurality of stages successively. The gas supply system supplies a gas to the gas-liquid contact unit, and causes the gas to be circulated along the array of the plurality of stages successively. The supplied liquid flows down on the plurality of vertical flat plates in each of the plurality of stages, and comes into contact with the supplied gas.

Inventors:
NAKAMURA SHIKO (JP)
ISO YOSHIYUKI (JP)
TAKANO KENJI (JP)
OKUNO SHINYA (JP)
IKEDA RYOSUKE (JP)
OKUHARA HIROHITO (JP)
Application Number:
PCT/JP2018/016750
Publication Date:
October 31, 2019
Filing Date:
April 25, 2018
Export Citation:
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Assignee:
IHI CORP (JP)
International Classes:
B01J10/02; B01D53/18; F28F25/02
Foreign References:
JP2018058008A2018-04-12
JPH02245251A1990-10-01
JPS4996367A1974-09-12
JPS62289218A1987-12-16
US3782703A1974-01-01
JP2000154975A2000-06-06
JPH08290047A1996-11-05
Attorney, Agent or Firm:
MIYOSHI Hidekazu et al. (JP)
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