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Title:
GAS-LIQUID REACTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/117136
Kind Code:
A1
Abstract:
Provided is a gas-liquid reaction device having: a gas supply passage for supplying a soluble gas to a reactor inlet at a constant flow rate; a liquid supply passage for supplying a liquid substrate to the reactor inlet at a constant flow rate; a reactor for obtaining a product by reacting the soluble gas with the liquid substrate; an air bubble detector for detecting air bubbles which can sometimes be included in product-containing liquid that is discharged from a reactor outlet; a product discharge passage for removing, at a constant flow rate, a portion of the product-containing liquid discharged from the reactor outlet; a return passage for supplying, to the reactor inlet, the remainder of the product-containing liquid discharged from the reactor outlet; and a control device for controlling at least one condition selected from the group consisting of the pressure within the reactor, the temperature withing the reactor, and the flow rate of the product-containing liquid in the return passage such that the amount of air bubbles included in the product-containing liquid is no larger than a predetermined amount.

Inventors:
KOBAYASHI EIICHIRO (JP)
ISHIKAWA TAKAHIRO (JP)
Application Number:
PCT/JP2017/045640
Publication Date:
June 28, 2018
Filing Date:
December 20, 2017
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NISSO ENG CO LTD (JP)
International Classes:
B01J10/00; B01F1/00; C07B61/00; C07C5/03; C07C15/073; C07C15/46
Domestic Patent References:
WO2005067862A12005-07-28
Foreign References:
JPH08268921A1996-10-15
JP2010241689A2010-10-28
JPS4948403B11974-12-21
JP2010119811A2010-06-03
Attorney, Agent or Firm:
KIKUMA, Tadayuki (JP)
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