GAS FOR PLASMA REACTION, PROCESS FOR PRODUCING THE SAME, AND USE

Title:

GAS FOR PLASMA REACTION, PROCESS FOR PRODUCING THE SAME, AND USE

Document Type and Number:

WIPO Patent Application WO/2003/041148

Kind Code:

A1

Abstract:

A gas for plasma reaction which comprises a C₅₋₆ chain perfluoroalkyne, preferably perfluoro−2−pentyne. This gas is suitable for use in the formation of a fine pattern by dry etching, formation of a thin film by CVD, or ashing. It is synthesized by contacting a dihydrofluoroalkane compound or monohydrofluoroalkene compound with a basic compound.

Inventors:

SUGAWARA MITSURU (JP)
YAMADA TOSHIRO (JP)
SUGIMOTO TATSUYA (JP)
TANAKA KIMIAKI (JP)

Application Number:

PCT/JP2002/011360

Publication Date:

May 15, 2003

Filing Date:

October 31, 2002

Export Citation:

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Assignee:

ZEON CORP (JP)
SUGAWARA MITSURU (JP)
YAMADA TOSHIRO (JP)
SUGIMOTO TATSUYA (JP)
TANAKA KIMIAKI (JP)

International Classes:

C07C17/25; H01L25/00; C07C21/22; C23C16/00; H01L21/3065; H01L21/311; (IPC1-7): H01L21/3065

Domestic Patent References:

WO2000059021A1

2000-10-05

Foreign References:

JPH09191002A	1997-07-22
EP0499984A1	1992-08-26

Other References: