Title:
GAS PROCESSING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2011/162023
Kind Code:
A1
Abstract:
Provided is a gas processing system suitable for achieving cost reduction, size reduction and improvement of maintenability of the entire gas processing system including a pipe. A gas processing system (1) is provided with: a water-cooled combustion-type harm removing device (2) which, with silane that is a semiconductor material gas and a gaseous fluoride such as NF3, CF4, C2F6, SF6, CHF3, or CF6 that is used as a cleaning gas when the interiors of closed chambers (C1, C2 … Cn) of a plasma CVD device and the like are cleaned by plasma as gases to be processed, performs combustion decomposition and washing dust collection on the gases to be processed; an electric dust collection device (3) which performs electric dust collection on process gas after the combustion decomposition and washing dust collection; and a pipe (4) for sending the process gas after the electric dust collection to a plant scrubber facility (5).
Inventors:
NAKAYAMA IZUMI (JP)
TAKAHASHI KATSUNORI (JP)
TAKAHASHI KATSUNORI (JP)
Application Number:
PCT/JP2011/060255
Publication Date:
December 29, 2011
Filing Date:
April 27, 2011
Export Citation:
Assignee:
EDWARDS JAPAN LTD (JP)
NAKAYAMA IZUMI (JP)
TAKAHASHI KATSUNORI (JP)
NAKAYAMA IZUMI (JP)
TAKAHASHI KATSUNORI (JP)
International Classes:
F23G7/06; B01D53/46; B01D53/68; F23J15/08
Foreign References:
| JP2010063951A | 2010-03-25 | |||
| JP2004044887A | 2004-02-12 | |||
| JP2007307556A | 2007-11-29 | |||
| JP2003024741A | 2003-01-28 | |||
| JP2007232308A | 2007-09-13 | |||
| JP2007232308A | 2007-09-13 |
Attorney, Agent or Firm:
WADA SHIGENORI (JP)
Wada 成 rule (JP)
Wada 成 rule (JP)
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Claims:
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