Title:
GAS SENSOR AND PREPARATION METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2022/139105
Kind Code:
A1
Abstract:
A gas sensor of the present invention comprises: a substrate layer; an insulator layer formed on the top surface of the substrate; a sensor material layer formed on a part of the top surface of the insulator layer; a first electrode formed on and coming into contact with the top surface of the insulator layer and the top surface of the sensor material layer; and a second electrode formed on the top surface of the insulator layer and the top surface of the sensor material layer, and disposed to be away from the first electrode on the top surface of the sensor material layer. The sensor material layer is formed into a calcogenide layer in which one or more from among elements of group 16 and one or more from among transition metal elements of groups 3 to 12 are bonded. In the method for preparing the gas sensor of the present invention, the sensor material layer is partially etched by means of photolithography, a metal layer for electrode is formed on the top surface of the sensor material layer which has been partially etched and the top surface of the insulator, and the sensor material layer can be exposed by partially etching the metal layer for electrode by means of photolithography. Therefore, the first and second electrodes of the gas sensor of the present invention can be prevented from falling off the sensor material layer by means of the adhesion between the first and second electrodes and the insulator layer.
Inventors:
LEE SOO MIN (KR)
LEE HI DEOK (KR)
LEE HI DEOK (KR)
Application Number:
PCT/KR2021/010743
Publication Date:
June 30, 2022
Filing Date:
August 12, 2021
Export Citation:
Assignee:
KOREA SENSOR LAB CO LTD (KR)
International Classes:
G01N27/407; G01N27/07; G01N27/30; H01L21/203; H01L21/205
Foreign References:
| KR20200101731A | 2020-08-28 | |||
| KR20120016444A | 2012-02-24 | |||
| KR101903147B1 | 2018-10-01 | |||
| KR20200109010A | 2020-09-22 | |||
| JP2014190912A | 2014-10-06 |
Attorney, Agent or Firm:
PARK, Kil Hwan et al. (KR)
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