Title:
GAS SUPPLY APPARATUS AND SEMICONDUCTOR MANUFACTURING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/196386
Kind Code:
A1
Abstract:
[Problem] To provide a gas supply apparatus capable of saving space and supplying, to a processing chamber, a mixed gas having a stable concentration component in a short time. [Solution] The present invention comprises: a plurality of fluid control units A1-D2 each including a flow path CH through which gas G flows and fluid control devices V1, FC, V2 provided in the middle of the flow path CH and controlling the flow of the gas G flowing through the flow path; and a merging flow path MCH1 including a plurality of connection portions LC1, LC2, RC1, RC2 which are fluidly connected to the plurality of fluid control units A1-D2, and a single gas outlet portion K1 through which the gas introduced through the plurality of connection portions LC1, LC2, RC1, RC2 is emitted, wherein the plurality of connection portions LC1, LC2, RC1 RC2 are arranged symmetrically with respect to the gas outlet portion K1 in the flow path direction of the merging flow path MCH1, and two or more fluid control units are fluidly connected to each of the plurality of connection portions LC1, LC2, RC1 RC2.
Inventors:
HIROSE JUN (JP)
SAWACHI ATSUSHI (JP)
MATSUDA TAKAHIRO (JP)
WATANABE KAZUNARI (JP)
SHIGYOU KOHEI (JP)
HOSHIKO TAIKI (JP)
SAWACHI ATSUSHI (JP)
MATSUDA TAKAHIRO (JP)
WATANABE KAZUNARI (JP)
SHIGYOU KOHEI (JP)
HOSHIKO TAIKI (JP)
Application Number:
PCT/JP2022/009314
Publication Date:
September 22, 2022
Filing Date:
March 04, 2022
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
FUJIKIN KK (JP)
FUJIKIN KK (JP)
International Classes:
H01L21/02
Domestic Patent References:
| WO2008023711A1 | 2008-02-28 |
Foreign References:
| JPH1028855A | 1998-02-03 |
Attorney, Agent or Firm:
KEN IP LAW FIRM (JP)
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