Title:
GAS SUPPLY APPARATUS FOR SUBSTRATE PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/164082
Kind Code:
A1
Abstract:
The present invention relates to a gas supply apparatus for a substrate processing apparatus, the gas supply apparatus comprising: a first supply line connected to a first gas spray unit; a plurality of first gas supply devices connected to the first supply line; a first measurement device measuring a first pressure at the first supply line; a second supply line connected to a second gas spray unit; a plurality of second gas supply devices connected to the second supply line; and a second measurement device measuring a second pressure at the second supply line, wherein the first measurement device checks if the first pressure deviates from a first reference value, and the second measurement device checks if the second pressure deviates from a second reference value.
Inventors:
JIN SE WHAN (KR)
ROH JAE SUNG (KR)
YOON HONG MIN (KR)
YOON HONG SOO (KR)
JANG YOUN JOO (KR)
CHO BYOUNG HA (KR)
CHO JI HYUN (KR)
ROH JAE SUNG (KR)
YOON HONG MIN (KR)
YOON HONG SOO (KR)
JANG YOUN JOO (KR)
CHO BYOUNG HA (KR)
CHO JI HYUN (KR)
Application Number:
PCT/KR2022/000513
Publication Date:
August 04, 2022
Filing Date:
January 12, 2022
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01L21/67
Foreign References:
| KR20080035485A | 2008-04-23 | |||
| KR20130078815A | 2013-07-10 | |||
| JP2017059199A | 2017-03-23 | |||
| KR101563635B1 | 2015-10-29 | |||
| US20180012735A1 | 2018-01-11 |
Attorney, Agent or Firm:
ASTRAN INT'L IP GROUP (KR)
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