GAS SWITCHING SYSTEM AND SEMICONDUCTOR PROCESSING METHOD RELATED THERETO

WIPO Patent Application WO/2023/109307

A1

The present disclosure relates to a gas switching system and a semiconductor processing method related thereto. In one embodiment of the present disclosure, a gas switching system is applicable to providing a gas switching function for a semiconductor processing device, and the semiconductor processing device at least comprises a process gas source arranged upstream, a process chamber arranged downstream, and a vacuum pump; and the gas switching system is arranged between the process gas source and the process chamber, and is characterized in that the gas switching system comprises: a first reactant gas inlet and a second reactant gas inlet, which are substantially centrally provided, the first reactant gas inlet and the second reactant gas inlet being respectively configured to receive a reactant gas from the process gas source; a first valve body unit and a second valve body unit, which are respectively arranged on two sides of the first reactant gas inlet; and a third valve body unit and a fourth valve body unit, which are respectively arranged on two sides of the second reactant gas inlet.

NOZAWA TOSHIHISA (CN)
QIU DAYI (CN)
LI JING (CN)
GUAN SHUAI (CN)

PCT/CN2022/126509

June 22, 2023

October 20, 2022

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PIOTECH INC (CN)

C23C16/455; H01L21/205

CN1969060A	2007-05-23
CN108962894A	2018-12-07
US20050221004A1	2005-10-06
CN1675750A	2005-09-28
US20120009785A1	2012-01-12
TW201823504A	2018-07-01

LEE AND LI - LEAVEN IPR AGENCY LTD. (CN)

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