Title:
GAS TREATING SYSTEM, GAS TREATING METHOD, AND CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/230618
Kind Code:
A1
Abstract:
[Problem] To allow for easy management of a gas remaining amount while reducing the burden on a gas user. [Solution] A gas treating system 1 according to an embodiment of the present disclosure comprises: a first container 5A1 that contains a first porous metal-organic framework capable of collecting a first gas included in a mixture gas flowing from an inflow side; a second container 5B1 that contains a second porous metal-organic framework capable of collecting a second gas included in a mixture gas flowing in series with the first container 5A1; a first gas detector (TCD 11) provided for performing detection in a space of a flow path downstream of the first container 5A1, and capable of detecting the first gas; and a control device 100 that outputs at least information about the state of the first container 5A1 on the basis of detection information based on the first gas detector.
Inventors:
HORI AKIHIRO (JP)
HATAOKA JUNICHI (JP)
HATAOKA JUNICHI (JP)
Application Number:
PCT/JP2022/016857
Publication Date:
November 03, 2022
Filing Date:
March 31, 2022
Export Citation:
Assignee:
SYNCMOF INC (JP)
International Classes:
B01D53/04; B01J20/26
Foreign References:
| US20150290575A1 | 2015-10-15 | |||
| JP2011105528A | 2011-06-02 |
Attorney, Agent or Firm:
ONE IP PATENT FIRM (JP)
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