Title:
GAS TREATMENT DEVICE AND GAS TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2023/190088
Kind Code:
A1
Abstract:
In a gas treatment device according to the present invention, a treatment tank has a treatment-tank downstream chamber into which a treated gas, obtained as a result of a gas to be treated undergoing an adsorption treatment by an adsorbing material, is introduced. The treatment-tank downstream chamber has connected thereto: an extraction flow channel through which the treated gas is discharged; a purge gas supply flow channel for supplying purge gas that is used to purge said treatment-tank downstream chamber; and a purge gas extraction flow channel through which the purge gas is discharged from the treatment-tank downstream chamber.
Inventors:
KOUDA KEITARO (JP)
HAYASHI TOSHIAKI (JP)
OKADA TAKEMASA (JP)
HAYASHI TOSHIAKI (JP)
OKADA TAKEMASA (JP)
Application Number:
PCT/JP2023/011658
Publication Date:
October 05, 2023
Filing Date:
March 23, 2023
Export Citation:
Assignee:
TOYOBO MC CORP (JP)
International Classes:
B01D53/04
Domestic Patent References:
| WO2020158442A1 | 2020-08-06 |
Foreign References:
| JPS51142047U | 1976-11-16 | |||
| JP2002204919A | 2002-07-23 | |||
| JPH05237333A | 1993-09-17 | |||
| JPS5624927U | 1981-03-06 |
Attorney, Agent or Firm:
FUKAMI PATENT OFFICE, P.C. (JP)
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