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Patent Searching and Data


Title:
GRID ASSEMBLY AND ION BEAM ETCHING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2014/097576
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a grid assembly, which is easy to assemble, and has high assembly repeatability, and an ion beam etching apparatus that is provided with the grid assembly. According to one embodiment of the present invention, a grid assembly (109) is configured by having three disc-like grids overlap each other, and the grid assembly has three fixing holes (116) for fixing the three grids, and three aligning holes (117) for aligning the three grids. At the time of assembly, the three grids are placed over a first ring such that aligning pins that are provided on the first ring are inserted into the aligning holes, respectively. Then, a second ring is placed over the three grids, bolts are inserted into the fixing holes, and fixing is performed. Since the fixing can be thus performed after performing the alignment using the fixed aligning pins, assembly can be easily performed.

Inventors:
TSUJIYAMA MASASHI (JP)
YASUMATSU YASUSHI (JP)
MOTOCHI KAORI (JP)
Application Number:
PCT/JP2013/007267
Publication Date:
June 26, 2014
Filing Date:
December 10, 2013
Export Citation:
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Assignee:
CANON ANELVA CORP (JP)
International Classes:
H01J27/02; H01J37/08; H01J37/305; H01L21/3065
Foreign References:
JPH08167397A1996-06-25
JP2004207148A2004-07-22
JP2000049144A2000-02-18
JPH04329249A1992-11-18
JP2007510263A2007-04-19
JP2005276790A2005-10-06
JP2013114894A2013-06-10
Attorney, Agent or Firm:
OKABE, Yuzuru et al. (JP)
Okabe 讓 (JP)
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