HAFNIUM AMIDE COMPLEX MANUFACTURING METHOD AND HAFNIUM-CONTAINING OXIDE FILM

WIPO Patent Application WO/2010/064524

A1

Disclosed is a method for manufacturing a hafnium amide complex represented by general formula: Hf(NR4R5)4, characterized in that a lithium alkylamide represented by general formula: Li(NR4R5) is added to a tertiary hafnium alkoxide complex represented by general formula: Hf[O(CR1R2R3)]4 and reacted, and then reduced-pressure distillation is performed. (In the formulas, R1, R2, and R3 independently represent either a phenyl group, a benzyl group, or a primary, secondary or tertiary alkyl group with carbon number 1-6; and R4 and R5 independently represent either a methyl group or an ethyl group. However, the case where all of R1, R2, and R3 are methyl groups, and the case where one of R1, R2, and R3 is an ethyl group and the other two are methyl groups are excluded.)

JP2005501123	Targeted bis-platinum polyamide as a prodrug: selective release of platinum
JP3544792	PRODUCTION OF EUROPIUM COMPLEX
WO/2004/110973	ANTI-TUMOUR PLATINUM (II) COMPLEXES WITH CAMPHORIC RADICALS AS LIGANDS

RYOKAWA ATSUSHI
YAMADA SHUHEI

PCT/JP2009/069157

June 10, 2010

November 11, 2009

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CENTRAL GLASS CO LTD (JP)
RYOKAWA ATSUSHI
YAMADA SHUHEI

C07C211/65; C23C16/40; C07F7/00

JP2005263771A	2005-09-29
JP2005298467A	2005-10-27
JP2005314785A	2005-11-10
JP2007051042A	2007-03-01
JP2008189550A	2008-08-21
US20090005584A1	2009-01-01

HASHIMOTO, Takeshi et al. (JP)
Hashimoto 剛 (JP)

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