Title:
HALOGEN ACID CORROSION INHIBITOR BASE
Document Type and Number:
WIPO Patent Application WO2002103081
Kind Code:
A3
Abstract:
The reaction product of thiourea (alternatively, a primary amine), formaldehyde, and an aromatic ketone (e.g.) acetophenone in the presence of an organic acid (e.g. acetic acid) and a mineral acid has been found effective as a corrosion inhibitor base for metals in acid media, particularly fluids containing halogen acids. The corrosion inhibitor base can be prepared in nearly 100% yield, and is a more effective base, as contrasted with bases prepared with fatty acids as contrasted with lower molecular weight organic acids such acetic acid.
Inventors:
CIZEK ARTHUR
Application Number:
PCT/US2002/016011
Publication Date:
August 05, 2004
Filing Date:
May 20, 2002
Export Citation:
Assignee:
BAKER HUGHES INC (US)
International Classes:
C09K8/54; C23F11/04; C23G1/06; (IPC1-7): C23F11/04
Foreign References:
US3077454A | 1963-02-12 | |||
US4104303A | 1978-08-01 | |||
US3634270A | 1972-01-11 | |||
US5854180A | 1998-12-29 | |||
US5366643A | 1994-11-22 | |||
US3630933A | 1971-12-28 | |||
US2758970A | 1956-08-14 |
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