Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS
Document Type and Number:
WIPO Patent Application WO2004074242
Kind Code:
A3
Abstract:
Compounds of the formula (I) or (II) wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar'1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D1-D-phenylene or -A r'1-A1-Y1-A1-A r'1-; wherein these radicals optionally are substituted; Ae', is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for exampfe a direct bond, -0-, -S-, or -NR6-; Y, inter alia is C1-C18alkylene; X is halogen; D is for example -0-, -S- or -NR6-; D, inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.

Inventors:
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MATSUMOTO AKIRA (CH)
MURER PETER (CH)
HINTERMANN TOBIAS (CH)
Application Number:
PCT/EP2004/050096
Publication Date:
February 03, 2005
Filing Date:
February 09, 2004
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
CIBA SC HOLDING AG (CH)
YAMATO HITOSHI (JP)
ASAKURA TOSHIKAGE (JP)
MATSUMOTO AKIRA (CH)
MURER PETER (CH)
HINTERMANN TOBIAS (CH)
International Classes:
C07C251/32; C07C251/48; C07C251/50; C07C251/62; C07C317/04; C07C381/00; C07D209/86; C07D307/91; C07D333/76; G03F7/004; C07D; (IPC1-7): G03F7/004; C07C317/04; C07C251/32
Domestic Patent References:
WO2002025376A22002-03-28
WO2002100903A12002-12-19
Foreign References:
US6261738B12001-07-17
US20010037037A12001-11-01
US4566901A1986-01-28
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: PROCESS FOR PRODUCING ALKYLBENZENE HYDROPEROXIDES

Next Patent: HETEROCYCLYL-3-SULFONYLINDAZOLES AS 5-HYDROXYTRYPTAMINE-6 LIGANDS