Title:
HEAT STORAGE TYPE GAS PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2006/001437
Kind Code:
A1
Abstract:
A heat storage type gas processing apparatus capable of providing a high sealing function by a simple structure. A gas to be treated (G) and a treated gas (G') are passed, in this order, through a plurality of heat storage chambers (3) having one ends allowed to communicate with a combustion chamber (6) by oppositely communicating a supply port (33) for the gas to be treated formed on the valve element (11) side and an exhaust port (35) for the treated gas, in this order, with supply and exhaust ports (16) formed on the distributor (10) side according to the rotation of the valve element (11). The apparatus also comprises an energizing means (44A) for the valve element supporting the valve element (11) in the state of being displaceable in the longitudinal direction to the distributor (10), and pressing the valve element (11) to the distributor (10) side in the non-acting state on an atmospheric chamber (13).
Inventors:
MATSUI YOSHIAKI (JP)
NAGATA YUJI (JP)
HORISAWA SATOSHI (JP)
MIWA TOMOTAKA (JP)
NAGATA YUJI (JP)
HORISAWA SATOSHI (JP)
MIWA TOMOTAKA (JP)
Application Number:
PCT/JP2005/011793
Publication Date:
January 05, 2006
Filing Date:
June 28, 2005
Export Citation:
Assignee:
TAIKISHA KK (JP)
MATSUI YOSHIAKI (JP)
NAGATA YUJI (JP)
HORISAWA SATOSHI (JP)
MIWA TOMOTAKA (JP)
MATSUI YOSHIAKI (JP)
NAGATA YUJI (JP)
HORISAWA SATOSHI (JP)
MIWA TOMOTAKA (JP)
International Classes:
F23G7/06; F16K11/074; F23L13/04; F23L15/02; F28D17/02; (IPC1-7): F23G7/06; F16K11/074; F23L13/04; F23L15/02; F28D17/02
Foreign References:
| JPH1061940A | 1998-03-06 | |||
| JP2001074225A | 2001-03-23 | |||
| US5628629A | 1997-05-13 | |||
| JPH0116616A |
Attorney, Agent or Firm:
Kitamura, Shuichiro (Nakanoshima 2-chome Kita-k, Osaka-shi Osaka 05, JP)
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