Title:
HIGH-DENSITY ULTRA-FINE FABRICS
Document Type and Number:
WIPO Patent Application WO/2010/002187
Kind Code:
A2
Abstract:
The present invention relates to high-density ultra-fine fabrics, and more particularly, to high-density ultra-fine fabrics which eliminate the necessity of cire processing as a post-processing. The present invention manufactures high-density ultra-fine fabrics in which one ply of either the warp or weft or both has a fineness of 5 denier or higher to 100 denier or lower, the monofilament in said one ply of either said warp or weft or both has a fineness of 0.1 denier or higher to 1.5 denier or lower, said warp is a nylon or a polyester, or a composite yarn of nylon and polyester, said weft is a nylon or a polyester, or a composite yarn of nylon and polyester, and either the warp or the weft is mixed or arrayed with a high stretch nylon yarn, a semi-oriented yarn of nylon material, or a spin draw yarn of nylon material having an elongation of 25% or higher, or PVA-based water soluble fibers having a shrunken k value of 22 or higher.
Inventors:
KIM IL HAN (KR)
KIM JI HAN (KR)
KIM CHUNG HYANG (KR)
KIM JONG BO (KR)
KIM JI HAN (KR)
KIM CHUNG HYANG (KR)
KIM JONG BO (KR)
Application Number:
PCT/KR2009/003582
Publication Date:
January 07, 2010
Filing Date:
July 01, 2009
Export Citation:
Assignee:
TEXLAND & NEXKO CO LTD (KR)
International Classes:
D03D15/56
Foreign References:
KR100565368B1 | 2006-03-28 | |||
KR20020035012A | 2002-05-09 | |||
KR20000013679A | 2000-03-06 |
Other References:
See also references of EP 2312027A4
Attorney, Agent or Firm:
CHA, Yoon Gun (KR)
차윤근 (KR)
차윤근 (KR)
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