Title:
HIGH INTEGRITY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING BULK QUANTITIES OF SAME
Document Type and Number:
WIPO Patent Application WO2005064037
Kind Code:
A3
Abstract:
A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.
Inventors:
MICHALUK CHRISTOPHER A (US)
HUBER LOUIS E (US)
ALEXANDER P TODD (US)
HUBER LOUIS E (US)
ALEXANDER P TODD (US)
Application Number:
PCT/US2004/042734
Publication Date:
December 08, 2005
Filing Date:
December 20, 2004
Export Citation:
Assignee:
CABOT CORP (US)
MICHALUK CHRISTOPHER A (US)
HUBER LOUIS E (US)
ALEXANDER P TODD (US)
MICHALUK CHRISTOPHER A (US)
HUBER LOUIS E (US)
ALEXANDER P TODD (US)
International Classes:
B21B23/00; C22F1/00; C22F1/18; C23C14/34; (IPC1-7): C23C14/34; C22F1/18
Foreign References:
| US6348113B1 | 2002-02-19 | |||
| US6264813B1 | 2001-07-24 | |||
| US6238494B1 | 2001-05-29 | |||
| US20030019746A1 | 2003-01-30 | |||
| DE2037542A1 | 1972-02-10 | |||
| US20020125128A1 | 2002-09-12 |
Download PDF: