Title:
HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE
Document Type and Number:
WIPO Patent Application WO/2014/129488
Kind Code:
A1
Abstract:
The present invention is a 1H-heptafluorocyclopentene characterized in having a purity of 99.9 wt% or greater and an organochlorine compound content of 350 wt ppm or less. The present invention provides a high-purity 1H-heptafluorocyclopentene that can be used as a gas in plasma reactions for semiconductors.
Inventors:
SUGIMOTO TATSUYA (JP)
Application Number:
PCT/JP2014/053863
Publication Date:
August 28, 2014
Filing Date:
February 19, 2014
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
C07C23/08; C07C17/354; C07C17/383; H01L21/3065; C07B61/00
Domestic Patent References:
| WO2010007968A1 | 2010-01-21 | |||
| WO1999033771A1 | 1999-07-08 | |||
| WO2009041560A1 | 2009-04-02 | |||
| WO2010007968A1 | 2010-01-21 |
Foreign References:
| JP2011105625A | 2011-06-02 | |||
| JP2009206444A | 2009-09-10 | |||
| JPH11292807A | 1999-10-26 | |||
| JP2010043034A | 2010-02-25 | |||
| JP2010126452A | 2010-06-10 | |||
| JP2000086548A | 2000-03-28 | |||
| JPH11292807A | 1999-10-26 |
Other References:
See also references of EP 2960224A4
Attorney, Agent or Firm:
OHISHI HARUHITO (JP)
Haruhito Oishi (JP)
Haruhito Oishi (JP)
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