Title:
HIGH-PURITY MULTI-ELEMENT ALLOY SPUTTER COATING MATERIAL FOR ADVANCED GENERATION HIGH-DEFINITION LIQUID CRYSTAL DISPLAY
Document Type and Number:
WIPO Patent Application WO/2023/221417
Kind Code:
A1
Abstract:
The present invention discloses a high-purity multi-element alloy sputter coating material for an advanced generation high-definition liquid crystal display, consisting of Mo, Ti, Ni, Cu and inevitable trace impurity elements, the contents thereof by atomic percentage being: 18≤Ti≤28 at%, 20≤Ni≤30 at%, and 0.3≤Cu≤6 at%. The crystal structure of the multi-element alloy sputter coating material is a multi-element alloy mixture without oxide island structure chains at least at grain boundaries of a mixed distribution of a MoTiNiCu alloy, a MoTiCu alloy and a MoNiCu alloy, Cu being accumulated in the grain boundaries of each of the MoTiNiCu alloy, the MoTiCu alloy and the MoNiCu alloy. The composition of the present invention is uniform, without segregation and cracking. It is a high-purity target material for display devices, having a purity of 99.99% or higher, and fully meets the requirements of the current advanced generation high-definition liquid crystal display industry for high-purity sputtering materials.
Inventors:
WEN HONGFU (CN)
LI PEILIN (CN)
LI PEILIN (CN)
Application Number:
PCT/CN2022/130630
Publication Date:
November 23, 2023
Filing Date:
November 08, 2022
Export Citation:
Assignee:
OMAT ADVANCED MAT GUANGDONG CO LTD (CN)
International Classes:
C22C27/04; C23C14/34; G02F1/13
Foreign References:
| CN114921761A | 2022-08-19 | |||
| CN115161603A | 2022-10-11 | |||
| CN114959397A | 2022-08-30 | |||
| CN103990802A | 2014-08-20 | |||
| CN110670032A | 2020-01-10 | |||
| CN102953036A | 2013-03-06 | |||
| JP2005029862A | 2005-02-03 |
Attorney, Agent or Firm:
JIAQUAN IP LAW (CN)
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