Title:
HIGH-TECHNOLOGY ANTIMICROBIAL PROTECTIVE FACE MASK
Document Type and Number:
WIPO Patent Application WO/2022/035406
Kind Code:
A3
Abstract:
The invention is a high-technology antimicrobial protective face mask as personal protective equipment and has an air cleaning system that acts against particles and harmful gases in the environment as well. The developed mask, in its most general form, includes: a pre-filter (4) and/or an air filter (7) comprising two layers in the form of antimicrobial and catalytic granular activated carbon and unadulterated/pure/additive-free granular activated carbon, air drawing fan (9) that facilitates breathing, a sanitation cell (10) comprising UV led lamp (14) that does not produce ozone with a UV-C beam wavelength to provide photocatalytic inactivation, UV-C radiation attenuating black ray trap (12) and nanometer-sized titanium dioxide coated inactivated surface (11), which is the contact path of UV-C radiation, an intermediate inactivated surface (6) between the outer cover (1) and the sanitation cell (10), a structure (19) under the sanitation cell (10), covering at least a portion of the user's mouth and/or nose, and an outlet port for discharging air in the mask, on said structure (19).
Inventors:
KOPARAL ALI SAVAS (TR)
UGURLU MEHMET (TR)
ERGUN IBRAHIM ERDINC (TR)
KOSEOGLU ERSIN (TR)
KARAER OZMEN FADIME (TR)
UGURLU MEHMET (TR)
ERGUN IBRAHIM ERDINC (TR)
KOSEOGLU ERSIN (TR)
KARAER OZMEN FADIME (TR)
Application Number:
PCT/TR2021/050804
Publication Date:
March 17, 2022
Filing Date:
August 13, 2021
Export Citation:
Assignee:
ANADOLU UNIV (TR)
ESKISEHIR TEKNIK UNIV (TR)
ESKISEHIR TEKNIK UNIV (TR)
International Classes:
A62B18/02; A41D13/11
Foreign References:
| KR101880532B1 | 2018-07-20 | |||
| CN107261810A | 2017-10-20 | |||
| US20120174922A1 | 2012-07-12 |
Attorney, Agent or Firm:
FULYA SUMERALP-SIMAJ PATENT CONSULTING LIMITED (TR)
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