Title:
HOLLOW SILICA PARTICLES AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2023/100676
Kind Code:
A1
Abstract:
The present invention provides novel hollow silica particles which have sufficiently low relative dielectric constant and sufficiently low dielectric loss, while exhibiting excellent dispersibility in a resin. The hollow silica particles according to the present invention are each provided with a shell layer, which contains silica, and each have a hollow space part within the shell layer. If A (g/cm3) is the density of the particles as determined by density measurement by means of a dry pycnometer using an argon gas, and B (m2/g) is the BET specific surface area, the product (A × B) of the density and the BET specific surface area is 1 to 120 m2/cm3.
Inventors:
KAMO HIROMICHI (JP)
KATAYAMA HAJIME (JP)
KATAYAMA HAJIME (JP)
Application Number:
PCT/JP2022/042755
Publication Date:
June 08, 2023
Filing Date:
November 17, 2022
Export Citation:
Assignee:
AGC INC (JP)
AGC SI TECH CO LTD (JP)
AGC SI TECH CO LTD (JP)
International Classes:
C08K3/36; C01B33/18; C08L101/00
Domestic Patent References:
| WO2021172293A1 | 2021-09-02 | |||
| WO2021172294A1 | 2021-09-02 | |||
| WO2019131658A1 | 2019-07-04 |
Foreign References:
| JP2020084128A | 2020-06-04 | |||
| JP2012136363A | 2012-07-19 |
Attorney, Agent or Firm:
EIKOH, P.C. (JP)
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