Title:
HYDROTHERMAL PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/195318
Kind Code:
A1
Abstract:
This hydrothermal processing device for hydrothermally processing a processing target comprises a reaction container constituted so as to be capable of receiving the processing target, a discharge path for discharging the reactants after the processing target has been hydrothermally processed, and an opening-closing mechanism for opening and closing the discharge path. The constitution is such that, prior to receiving the processing target, a gas phase and a liquid phase constituted by water at 120°C to 240°C are accommodated inside the reaction container, and the processing target received by the reaction container is supplied into the liquid phase.
Inventors:
NOMA AKIRA (JP)
AOKI YASUMICHI (JP)
KAWAI KAZUHIRO (JP)
YUKUMOTO ATSUHIRO (JP)
SEIKI YOSHIO (JP)
YOSHIKAWA KUNIO (JP)
AOKI YASUMICHI (JP)
KAWAI KAZUHIRO (JP)
YUKUMOTO ATSUHIRO (JP)
SEIKI YOSHIO (JP)
YOSHIKAWA KUNIO (JP)
Application Number:
PCT/JP2020/006012
Publication Date:
October 01, 2020
Filing Date:
February 17, 2020
Export Citation:
Assignee:
MITSUBISHI HEAVY IND LTD (JP)
TOKYO INST TECH (JP)
TOKYO INST TECH (JP)
International Classes:
B09B3/00; C02F11/08
Domestic Patent References:
| WO2013046622A1 | 2013-04-04 | |||
| WO2013046624A1 | 2013-04-04 |
Foreign References:
| JP2010029862A | 2010-02-12 | |||
| JP2001046858A | 2001-02-20 | |||
| JP2001046857A | 2001-02-20 | |||
| JP2002126490A | 2002-05-08 | |||
| JP2010279255A | 2010-12-16 | |||
| JP2000334425A | 2000-12-05 |
Attorney, Agent or Firm:
SEISHIN IP PATENT FIRM, P.C. (JP)
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