Title:
ILLUMINATING OPTICAL SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2010/007945
Kind Code:
A1
Abstract:
Provided is an illuminating optical system (ILS) wherein a luminous flux outputted from a light source is inputted to a first fly-eye optical system (22), and luminous fluxes outputted from a plurality of mirror elements (22a) configuring the first fly-eye optical system (22) are radiated onto an illuminating region (27R) through a second fly-eye optical system (23) and a capacitor optical system. A reflection surface of each of the mirror elements (22a) has a width in one direction narrower than that in the direction orthogonally intersecting therewith, and the reflectance distribution of the mirror element (22a) in one direction forms a trapezoidal shape. Intensity distribution of the illuminating region can be nonuniformly set, and respective points in the illuminating region can be illuminated with luminous fluxes having substantially the same open angle.
Inventors:
SHIRAISHI MASAYUKI (JP)
Application Number:
PCT/JP2009/062592
Publication Date:
January 21, 2010
Filing Date:
July 10, 2009
Export Citation:
Assignee:
NIKON CORP (JP)
SHIRAISHI MASAYUKI (JP)
SHIRAISHI MASAYUKI (JP)
International Classes:
H01L21/027; G02B19/00; G03F7/20
Domestic Patent References:
| WO2004100236A1 | 2004-11-18 | |||
| WO1999036832A1 | 1999-07-22 |
Attorney, Agent or Firm:
OMORI SATOSHI (JP)
Omori 聡 (JP)
Omori 聡 (JP)
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