IMAGE FORMING MATERIAL HAVING BLUISH-VIOLET LASER-PHOTOSENSITIVE RESIST MATERIAL LAYER AND RESIST IMAGE FORMING METHOD THEREFOR

WIPO Patent Application WO/2004/015497

A1

An image forming material having a bluish-violet laser-photosensitive resist material layer highly sensitive to a laser beam in a bluish-violet region and free from a decrease in sensitivity even a film thickness is increased. An image forming material comprising a bluish-violet laser-photosensitive resist material layer formed on a substrate to be worked, wherein the photosensitive resist material layer has a bluish-violet laser-photosensitive resist material layer having a film thickness of at least 10 μm and an absorbance at a wavelength of 405 nm of up to 0.3 per film thickness of 1 μm; and a resist image forming method of scanning and exposing the photosensitive resist material layer of the image forming material by a laser beam having a wavelength of 320-450 nm, and then developing the resultant material.

URANO TOSHIYUKI (JP)
KAMEYAMA YASUHIRO (JP)
FUJITA RIEKO (JP)
MIYAZAWA TAKASHI (JP)
TOSHIMITSU ERIKO (JP)

PCT/JP2003/009932

February 19, 2004

August 05, 2003

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MITSUBISHI CHEM CORP (JP)
URANO TOSHIYUKI (JP)
KAMEYAMA YASUHIRO (JP)
FUJITA RIEKO (JP)
MIYAZAWA TAKASHI (JP)
TOSHIMITSU ERIKO (JP)

C08F2/50; G03F7/004; G03F7/031; G03F7/033; (IPC1-7): G03F7/004; C08F2/50; G03F7/038; G03F7/039

EP1148387A1	2001-10-24
EP0985683A1	2000-03-15
EP1048982A1	2000-11-02
JP2002202598A	2002-07-19
JP2002072460A	2002-03-12
JP2002148801A	2002-05-22
JP2002169275A	2002-06-14
JP2003195526A	2003-07-09
JP2003167329A	2003-06-13
JP2002244288A	2002-08-30

Senmyo, Kenji (38 Kanda-Higashimatsushitach, Chiyoda-ku Tokyo, JP)

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