Title:
IMAGEABLE COATING, THERMAL NEGATIVE-WORKING LITHOGRAPHY PRINTING PLATE, AND PLATEMAKING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2018/033115
Kind Code:
A1
Abstract:
An imageable coating, a thermal negative-working lithography printing plate, and a platemaking method therefor. The imageable coating comprises the following constituents in parts by weight: a radically polymerizable compound 20-60 parts, a radiation-absorbing compound 0.5-12 parts, a free radical initiator 1-25 parts, a binding agent 10-70 parts, and a development accelerator 0.5-15 parts. The platemaking method comprises the following steps: S1, manufacturing a printing plate precursor, the printing plate precursor comprising a substrate having a hydrophilic surface or being provided with a hydrophilic layer and the imageable coating covering the substrate; S2, patternedly exposing the printing plate precursor, thus forming an exposed area and an unexposed area; and S3, removing the unexposed area via a development process. The employment of the imageable coating and the plate making method allows the implementation of a flexible development process of "in-unit development" or "off-unit development" and produces a printing plate provided with great printing performance.
Inventors:
TAO TING (CN)
YUNG NGANHAU (CN)
YING ZUOTING (CN)
HUANG YING (CN)
GAO MIAO (CN)
XU NENGPING (CN)
LIU CHONGSHUANG (CN)
YUNG NGANHAU (CN)
YING ZUOTING (CN)
HUANG YING (CN)
GAO MIAO (CN)
XU NENGPING (CN)
LIU CHONGSHUANG (CN)
Application Number:
PCT/CN2017/097860
Publication Date:
February 22, 2018
Filing Date:
August 17, 2017
Export Citation:
Assignee:
ZHEJIANG KONITA NEW MAT CO LTD (CN)
International Classes:
B41C1/10
Foreign References:
CN105612057A | 2016-05-25 | |||
CN101305324A | 2008-11-12 | |||
CN106313870A | 2017-01-11 | |||
CN103797421A | 2014-05-14 | |||
CN101322075A | 2008-12-10 | |||
EP1788450B1 | 2009-02-04 | |||
EP2753981B1 | 2015-10-14 |
Other References:
See also references of EP 3501826A4
Attorney, Agent or Firm:
SUNSHINE INTELLECTUAL PROPERTY INTERNATIONAL CO., LTD (CN)
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