Title:
IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2015/155988
Kind Code:
A1
Abstract:
Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.
Inventors:
BYUNG-JIN CHOI (JP)
ANSHUMAN CHERALA (JP)
ZHENGMAO YE (JP)
XIAOMING LU (JP)
KANG LUO (JP)
KAWAHARA NOBUTO (JP)
MIYAJIMA YOSHIKAZU (JP)
ANSHUMAN CHERALA (JP)
ZHENGMAO YE (JP)
XIAOMING LU (JP)
KANG LUO (JP)
KAWAHARA NOBUTO (JP)
MIYAJIMA YOSHIKAZU (JP)
Application Number:
PCT/JP2015/001970
Publication Date:
October 15, 2015
Filing Date:
April 07, 2015
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
| WO2010047788A2 | 2010-04-29 | |||
| WO2007126767A2 | 2007-11-08 | |||
| WO2006083520A2 | 2006-08-10 |
Foreign References:
| US20120274006A1 | 2012-11-01 | |||
| US20130056904A1 | 2013-03-07 | |||
| JP2010269580A | 2010-12-02 | |||
| US20100096774A1 | 2010-04-22 | |||
| JP2015012033A | 2015-01-19 |
Attorney, Agent or Firm:
TAKAOKA, Ryoichi et al. (Ikebukuro Tosei Building 5th Floor, 5-4-7, Nishi-Ikebukuro, Toshima-k, Tokyo 21, JP)
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