Title:
IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS
Document Type and Number:
WIPO Patent Application WO2005038523
Kind Code:
A3
Abstract:
One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.
Inventors:
BAILEY TODD C (US)
JOHNSON STEPHEN C (US)
COLBURN MATTHEW E (US)
CHOI BYUNG J (US)
SMITH BRITAIN J (US)
EKERDT JOHN G (US)
WILLSON CARLTON G (US)
SREENIVASAN SIDLGATA V (US)
JOHNSON STEPHEN C (US)
COLBURN MATTHEW E (US)
CHOI BYUNG J (US)
SMITH BRITAIN J (US)
EKERDT JOHN G (US)
WILLSON CARLTON G (US)
SREENIVASAN SIDLGATA V (US)
Application Number:
PCT/US2004/030269
Publication Date:
June 15, 2006
Filing Date:
September 16, 2004
Export Citation:
Assignee:
UNIV TEXAS (US)
International Classes:
G03F9/00; G03F7/00; G03F
Foreign References:
| US6687787B1 | 2004-02-03 | |||
| US6165911A | 2000-12-26 | |||
| US5512131A | 1996-04-30 | |||
| US6309580B1 | 2001-10-30 | |||
| US20050158637A1 | 2005-07-21 |
Other References:
See also references of EP 1664925A4
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