IMPRINT MOLD, IMPRINT METHOD, WIRE GRID POLARIZER, AND METHOD OF MANUFACTURING SAME

WIPO Patent Application WO/2016/021475

A1

In order to enable highly accurate positioning, there is provided an imprint mold (11) comprising a main pattern region (13) and a measurement pattern region (16) that are set on one face of a flexible base material (12), the imprint mold having a configuration such that: the measurement pattern region (16) includes at least a region positioned inside an outline (13a) of the main pattern region (13); the main pattern region (13) has a main pattern (14) positioned therein which is configured from a plurality of linear main convex patterns (15) arranged via desired spaces; the measurement pattern region (16) has a measurement pattern (17) positioned therein which is configured from a plurality of linear unit convex patterns (18a, 18b) arranged via desired spaces; and the main pattern (14) and the measurement pattern (17) have the same line direction. An imprint method includes press-fitting and then separating the imprint mold (11) along the line direction of the main pattern (14).

OOKAWA YASUHIRO (JP)
IIMURA KEITA (JP)
NAKATA NAOKO (JP)

PCT/JP2015/071599

February 11, 2016

July 30, 2015

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DAINIPPON PRINTING CO LTD (JP)

H01L21/027; B29C59/02; G02B5/30

WO2013126750A1	2013-08-29
WO2008142958A1	2008-11-27

JP2006100619A	2006-04-13
JP2007035768A	2007-02-08
JP2012104697A	2012-05-31
JP2008145581A	2008-06-26
JP2001274073A	2001-10-05
JP2009262546A	2009-11-12
JP2012114158A	2012-06-14

YONEDA Junzo et al. (JP)
Junzo Yoneda (JP)

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