IN-VACUUM HIGH SPEED PRE-CHILL AND POST-HEAT STATIONS

Title:

IN-VACUUM HIGH SPEED PRE-CHILL AND POST-HEAT STATIONS

Document Type and Number:

WIPO Patent Application WO/2014/022844

Kind Code:

A3

Abstract:

An ion implantation system provides ions to a workpiece positioned in a vacuum environment of a process chamber on a cooled chuck. A pre-chill station within the process chamber has a chilled workpiece support configured to cool the workpiece to a first temperature, and a post-heat station within the process chamber, has a heated workpiece support configured to heat the workpiece to a second temperature. The first temperature is lower than a process temperature, and the second temperature is greater than an external temperature. A workpiece transfer arm is further configured to concurrently transfer two or more workpieces between two or more of the chuck, a load lock chamber, the pre-chill station, and the post-heat station.

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JP2011018578	ION IMPLANTATION DEVICE EQUIPPED WITH TWO OR MORE UNIFORMIZING LENSES, AND SELECTING METHOD OF TWO OR MORE UNIFORMIZING LENSES
WO/2001/009918	ENHANCED ELECTRON EMISSIVE SURFACES FOR A THIN FILM DEPOSITION SYSTEM USING ION SOURCES

Inventors:

LEE WILLIAM (US)
REYNOLDS WILLIAM (US)
STONE STANLEY (US)

Application Number:

PCT/US2013/053567

Publication Date:

March 27, 2014

Filing Date:

October 02, 2013

Export Citation:

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Assignee:

AXCELIS TECH INC (US)
LEE WILLIAM (US)
REYNOLDS WILLIAM (US)
STONE STANLEY (US)

International Classes:

H01J37/317; H01J37/18; H01J37/20; H01L21/67; H01L21/68

Foreign References:

US20080044938A1	2008-02-21
US20080042078A1	2008-02-21
US20080152463A1	2008-06-26
US20080224491A1	2008-09-18

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