INDIUM TARGET AND PROCESS FOR PRODUCING SAME - JX NIPPON MINING & METALS CORP

Title:

INDIUM TARGET AND PROCESS FOR PRODUCING SAME

Document Type and Number:

WIPO Patent Application WO/2012/144089

Kind Code:

A1

Abstract:

Provided are: a novel indium target which can satisfactorily minimize the anomalous discharge during sputtering and the occurrence of particles in a formed film; and a process for producing the same. This indium target contains, per gram, up to 1500 inclusions of 0.5 to 20μm in particle diameter.

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Inventors:

ENDO YOUSUKE (JP)
SAKAMOTO MASARU (JP)

Application Number:

PCT/JP2011/065587

Publication Date:

October 26, 2012

Filing Date:

July 07, 2011

Export Citation:

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Assignee:

JX NIPPON MINING & METALS CORP (JP)
ENDO YOUSUKE (JP)
SAKAMOTO MASARU (JP)

International Classes:

C23C14/34

Foreign References:

JPS6344820B2	1988-09-07
JP2010024474A	2010-02-04
JPH0925564A	1997-01-28
JPH05214519A	1993-08-24

Attorney, Agent or Firm:

AXIS Patent International (JP)
Axis international patent business corporation (JP)

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