Title:
INDUCTIVELY COUPLED PLASMA MASS SPECTROMETER
Document Type and Number:
WIPO Patent Application WO/2023/089852
Kind Code:
A1
Abstract:
One embodiment of the ICP-MS according to the present invention comprises: an ion source (5) for ionising a sample component by inductively coupled plasma ionisation; a vacuum chamber (3) into which generated ions are introduced; a cell (10) which is located inside the vacuum chamber and brings the ions into contact with a prescribed gas; a mass spectrometry unit (16) which is located downstream of the vacuum chamber and performs a mass spectrometric analysis on ions that have passed through the cell or ions derived therefrom; a first gas introduction part (23) which introduces the prescribed gas into the cell; a second gas introduction part (24) which introduces the prescribed gas inside the vacuum chamber but outside the cell; and a control unit (20, 22) which controls the introduction of gas such that the gas is introduced by the first gas introduction part when performing the analysis while bringing the gas into contact with ions in the cell, and the gas is introduced by the second gas introduction part when performing the analysis without bringing the gas into contact with ions in the cell. As a result, it is possible to reduce signal drift when switching between a collision measurement mode and a non-collision measurement mode.
Inventors:
MATSUSHITA TOMOYOSHI (JP)
FUJITA RYO (JP)
TANIGUCHI JUNICHI (JP)
FUJITA RYO (JP)
TANIGUCHI JUNICHI (JP)
Application Number:
PCT/JP2022/022452
Publication Date:
May 25, 2023
Filing Date:
June 02, 2022
Export Citation:
Assignee:
SHIMADZU CORP (JP)
International Classes:
G01N27/62; H01J49/00; H01J49/06; H01J49/10; H01J49/42
Foreign References:
| JP2002526027A | 2002-08-13 |
Attorney, Agent or Firm:
KYOTO INTERNATIONAL PATENT LAW OFFICE (JP)
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