Title:
INSPECTION METHOD, INSPECTION DEVICE, AND INSPECTION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2021/124646
Kind Code:
A1
Abstract:
In this inspection method, light is emitted onto an object 10 under inspection comprising a base film 8A having an in-plane retardation value of 50 nm or more for a wavelength of 550 nm and a retardation film 7A that is formed on one side of the base film 8A and comprises a cured polymerizable liquid crystal compound, and a determination is made as to whether there is a defect on the retardation film. A first linear polarization plate 3, the object 10 under inspection, a retardation filter 4, and a second linear polarization plate 5 are arranged so as to be aligned in the order listed. The slow axis of the base film and the transmission axis of the first linear polarization plate or second linear polarization plate are roughly orthogonal or roughly parallel to each other. The slow axis of the retardation film and the slow axis of the retardation filter are roughly parallel to each other. When viewed from the optical axis direction of the light, the transmission axis of the first linear polarization plate and the absorption axis of the second linear polarization plate are roughly linearly symmetrical, with the slow axis of the retardation film as the axis of symmetry.
Inventors:
KOBAYASHI SHINJI (JP)
Application Number:
PCT/JP2020/037525
Publication Date:
June 24, 2021
Filing Date:
October 02, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
G01N21/89; G01N21/892; G02B5/30
Domestic Patent References:
| WO2016105017A1 | 2016-06-30 |
Foreign References:
| JP2013050393A | 2013-03-14 | |||
| JP2019070617A | 2019-05-09 | |||
| JP2019151099A | 2019-09-12 | |||
| JP2006003174A | 2006-01-05 | |||
| JP2009097915A | 2009-05-07 | |||
| US20100157297A1 | 2010-06-24 |
Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
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