Title:
INSPECTION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2022/208572
Kind Code:
A1
Abstract:
Provided is an inspection system capable of highly precise estimation of the electrical characteristics of a sample regardless of the initial charge state of a wafer. This inspection system for inspecting the electrical characteristics of a sample is provided with a charged particle beam device and a computer system, wherein a pulsed charged particle beam is irradiated under a plurality of pulse conditions onto reference patterns having the same electrical characteristics as an inspection pattern and wherein an initial charge state caused by a charge that is not dissipated according to the electric discharge time constant of the sample can be ignored, whereby reference data expressing secondary charged particle signals from the reference patterns corresponding to the plurality of pulse conditions is obtained, and the initial charge state of an inspection region including the inspection pattern is evaluated on the basis of the reference data.
Inventors:
NAKAMURA YOHEI (JP)
TAKEDA NAOKO (JP)
TSUNO NATSUKI (JP)
TAKADA SATOSHI (JP)
KIMIZUKA HEITA (JP)
TAKEDA NAOKO (JP)
TSUNO NATSUKI (JP)
TAKADA SATOSHI (JP)
KIMIZUKA HEITA (JP)
Application Number:
PCT/JP2021/013189
Publication Date:
October 06, 2022
Filing Date:
March 29, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/22
Domestic Patent References:
| WO2011058950A1 | 2011-05-19 |
Foreign References:
| JP2018137160A | 2018-08-30 | |||
| JP2007053035A | 2007-03-01 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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