ION BEAM APPARATUS AND ION-BEAM PROCESSING METHOD

Title:

ION BEAM APPARATUS AND ION-BEAM PROCESSING METHOD

Document Type and Number:

WIPO Patent Application WO/2011/129315

Kind Code:

A1

Abstract:

Provided are an ion beam apparatus and an ion-beam processing method, wherein a standardized probe can be manufactured without requiring skills for processing probes. Executed in this method is: a probe-shape generating process for detecting the shape of a probe on the basis of current flowing into the probe, which is detected by a probe-current detection device; a probe-tip coordinates extraction processing for detecting a front-tip position of the prove from the probe shape; a probe-outline extraction processing for generating a probe outline approximating the external form of the probe, from the front-tip position of the probe and the probe shape; a probe center-line extraction processing for generating a center line and a vertical line of the probe from the probe outline; a processing-pattern generating processing for generating a processing pattern on the basis of the front-tip position of the prove, the center line of the probe, the vertical line of the probe, and pre-determined shape and dimensions of a sharp edge section of the probe; and an ion-beam stopping processing for stopping the ion-beam processing on the basis of the processing pattern.

Inventors:

KITAYAMA SHINYA (JP)
TOMIMATSU SATOSHI (JP)
ONISHI TSUYOSHI (JP)

Application Number:

PCT/JP2011/059044

Publication Date:

October 20, 2011

Filing Date:

April 12, 2011

Export Citation:

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Assignee:

HITACHI HIGH TECH CORP (JP)
KITAYAMA SHINYA (JP)
TOMIMATSU SATOSHI (JP)
ONISHI TSUYOSHI (JP)

International Classes:

H01J37/317; H01J37/30

Foreign References:

JP2000171364A	2000-06-23
JP2009109236A	2009-05-21
JP2004340611A	2004-12-02
JP2005259353A	2005-09-22
JP2002150983A	2002-05-24
JPH0552721A	1993-03-02
JP2010177063A	2010-08-12
JPH0552721A	1993-03-02
JP2000171364A	2000-06-23

Other References: