Title:
ION BOMBARDMENT DEVICE AND ION BOMBARDMENT PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2024/048261
Kind Code:
A1
Abstract:
An ion bombardment device (1) has: a vacuum chamber (2); a base-material support part (11); a filament (3); a discharge power supply (22); a filament heating power supply (3T); and a magnetic-field generation mechanism (20). The filament 3 has one end section (31) and the other end section (32). The magnetic-field generation mechanism (20) includes: a first magnetic-field generation unit (201) that generates a first magnetic field in a region containing the one end section (31) of the filament (3); and a second magnetic-field generation unit (202) that generates a second magnetic field in a region containing the other end section (32) of the filament (3). The intensities of plasmas in the vicinity of the end sections of the filament (3) are increased in the first magnetic field and the second magnetic field, and thus, the unevenness in the plasma density and the unevenness in the etching amount can be reduced.
Inventors:
TAKAHASHI TETSUYA
TAKEI RYOSUKE
TAKEI RYOSUKE
Application Number:
PCT/JP2023/029478
Publication Date:
March 07, 2024
Filing Date:
August 14, 2023
Export Citation:
Assignee:
KOBE STEEL LTD (JP)
International Classes:
C23C14/02; H05H1/46
Foreign References:
| JP2010126762A | 2010-06-10 | |||
| JPH04341558A | 1992-11-27 | |||
| JPH05106031A | 1993-04-27 | |||
| JP2004514264A | 2004-05-13 |
Attorney, Agent or Firm:
KOTANI, Masataka et al. (JP)
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