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Title:
IONIZING RADIATION-CURABLE PROTECTIVE SOLUTION FOR EMULSION MASK, AND EMULSION MASK PRODUCED USING SAME
Document Type and Number:
WIPO Patent Application WO/2011/096081
Kind Code:
A1
Abstract:
Disclosed are: a protective solution for an emulsion mask, which enables the formation of a protective film within a short time and can provide excellent adhesion of an emulsion mask having the protective film formed thereon and excellent surface hardness of the emulsion mask; and an emulsion mask produced using the protective solution. Specifically disclosed is an ionizing radiation-curable protective solution for an emulsion mask, which comprises a (meth)acrylate oligomer and/or a (meth)acrylic monomer and a reactive hydrophilic substance capable of being copolymerized with the oligomer and/or the monomer. The reactive hydrophilic substance comprises a (meth)acrylic modified hydrophilic substance, particularly comprises a (meth)acrylic modified phosphoric acid ester and/or a (meth)acrylic modified quaternary ammonium salt.

Inventors:
NEGISHI TOMOKO (JP)
HASEGAWA TAKESHI (JP)
Application Number:
PCT/JP2010/051794
Publication Date:
August 11, 2011
Filing Date:
February 08, 2010
Export Citation:
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Assignee:
KIMOTO KK (JP)
NEGISHI TOMOKO (JP)
HASEGAWA TAKESHI (JP)
International Classes:
G03F1/48; G03F1/54
Domestic Patent References:
WO2001092957A12001-12-06
Foreign References:
JP2002012796A2002-01-15
JP2004077690A2004-03-11
JP2005181931A2005-07-07
JP2010085597A2010-04-15
JP2002241446A2002-08-28
JP2003344982A2003-12-03
JP2009169351A2009-07-30
JP2002173651A2002-06-21
Attorney, Agent or Firm:
Sannozaka Patent Law Firm (JP)
Patent business corporation The Sanno hill patent firm (JP)
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