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Title:
LASER ANNEAL DEVICE AND LASER ANNEAL METHOD
Document Type and Number:
WIPO Patent Application WO/2018/211928
Kind Code:
A1
Abstract:
A laser anneal device provided with: a light source which generates laser light; a homogenizer which makes the intensity distribution of laser light irradiated from the light source substantially uniform; a capacitor lens which collects the laser light with the intensity distribution having been made uniform by the homogenizer; a cylindrical lens which converts the laser light collected by the capacitor lens into a line beam; and a projection mask which is disposed on an optical path between the cylindrical lens and an object to be irradiated with the line beam to reduce interference irregularities due to the line beam that may be caused on the object to be irradiated due to the interference of laser light passing through the homogenizer.

Inventors:
YANAGAWA YOSHIKATSU (JP)
FUJIMORI YUYA (JP)
KAJIYAMA KOICHI (JP)
Application Number:
PCT/JP2018/016722
Publication Date:
November 22, 2018
Filing Date:
April 25, 2018
Export Citation:
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Assignee:
V TECH CO LTD (JP)
International Classes:
H01L21/268; B23K26/066; B23K26/073; H01L21/20
Foreign References:
JP2009094329A2009-04-30
JP2004012757A2004-01-15
JP2004063924A2004-02-26
JPH11212021A1999-08-06
JPH11251261A1999-09-17
JP2004172605A2004-06-17
JP2003124136A2003-04-25
JP2006339630A2006-12-14
JP2008124149A2008-05-29
JP2011230159A2011-11-17
JP2005161372A2005-06-23
JP2017510975A2017-04-13
Attorney, Agent or Firm:
SHIRASAKA & PATENT PARTNERS (JP)
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